Publications

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A
Lomenzo, P. D., Q. Takmeel, S. Moghaddam, and T. Nishida, "Annealing behavior of ferroelectric Si-doped HfO2 thin films", Thin Solid Films, vol. 615, pp. 139 - 144, Jan-09-2016.
M
Lomenzo, P. D., Q. Takmeel, C. Zhou, C-C. Chung, S. Moghaddam, J. L. Jones, and T. Nishida, "Mixed Al and Si doping in ferroelectric HfO 2 thin films", Applied Physics Letters, vol. 107, issue 24, pp. 242903, Feb-12-2016, 2015.