Event category:
Event date:
Friday, September 21, 2018 - 12:30pm to 1:30pm
Event location:
Benton 214 and Benton 230
Come on out to learn about the research going on in the Nishida group! The students and research topics can be found below.
Benton 214 (M-test):
- Paul Chojecki - Stress measurements and modeling of ferroelectric hafnium oxide
- Zane Forrester - Pyroelectric characterization of thin hafnium oxide films
- Kartik Sondhi - Flexible and Stretchable Printed electronics
- Glen Walters - Ferroelectric fabrication and characterization of hafnium oxide for non-volatile memory
Benton 230 (Microfab):
- Aftab Bhanvadia - Development of a microstereolithography system (3D printing) for micro-devices (Demo outside, tour for those with access to 230)
