| Title | Annealing behavior of ferroelectric Si-doped HfO2 thin films |
| Publication Type | Journal Article |
| Year of Publication | 2016 |
| Authors | Lomenzo, P. D., Q. Takmeel, S. Moghaddam, and T. Nishida |
| Journal | Thin Solid Films |
| Volume | 615 |
| Pagination | 139 - 144 |
| Date Published | Jan-09-2016 |
| ISSN | 00406090 |
| URL | http://linkinghub.elsevier.com/retrieve/pii/S0040609016303145 |
| DOI | 10.1016/j.tsf.2016.07.009 |
| Short Title | Thin Solid Films |
