| Title | Mixed Al and Si doping in ferroelectric HfO 2 thin films |
| Publication Type | Journal Article |
| Year of Publication | 2015 |
| Authors | Lomenzo, P. D., Q. Takmeel, C. Zhou, C-C. Chung, S. Moghaddam, J. L. Jones, and T. Nishida |
| Journal | Applied Physics Letters |
| Volume | 107 |
| Issue | 24 |
| Pagination | 242903 |
| Date Published | Feb-12-2016 |
| ISSN | 0003-6951 |
| URL | http://aip.scitation.org/doi/10.1063/1.4937588 |
| DOI | 10.1063/1.4937588 |
| Short Title | Appl. Phys. Lett. |