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TZID:America/New_York
BEGIN:STANDARD
DTSTART:20181104T020000
TZOFFSETFROM:-0400
TZOFFSETTO:-0500
TZNAME:EST
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BEGIN:DAYLIGHT
DTSTART:20180311T020000
TZOFFSETFROM:-0500
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RDATE:20190310T020000
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BEGIN:VEVENT
UID:calendar.1923.field_event_date.0@www.img.ufl.edu
DTSTAMP:20260306T183242Z
CREATED:20180920T152510Z
DESCRIPTION:Come on out to learn about the research going on in the Nishida
  group! The students and research topics can be found below.\n\n\nBenton 2
 14 (M-test):\nPaul Chojecki - Stress measurements and modeling of ferroele
 ctric hafnium oxide   \nZane Forrester - Pyroelectric characterization of 
 thin hafnium oxide films  \nKartik Sondhi - Flexible and Stretchable Print
 ed electronics\nGlen Walters - Ferroelectric fabrication and characterizat
 ion of hafnium oxide for non-volatile memory \n\n\nBenton 230 (Microfab):
 \nAftab Bhanvadia - Development of a microstereolithography system (3D pri
 nting) for micro-devices (Demo outside\, tour for those with access to 230
 )\n\n\n\n\n\nEvent date: \n\nFriday\, September 21\, 2018 - 12:30pm to 1:3
 0pm\n\nEvent location: \n\nBenton 214 and Benton 230
DTSTART;TZID=America/New_York:20180921T123000
DTEND;TZID=America/New_York:20180921T133000
LAST-MODIFIED:20180920T161239Z
LOCATION:Benton 214 and Benton 230
SUMMARY:Nishida Group Open House
URL;TYPE=URI:https://www.img.ufl.edu/events/1923/nishida-group-open-house
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