Suthram, S., Y. Sun, P. Majhi, I. Ok, H. Kim, H. R. Harris, N. Goel, S. Parthasarathy, A. D. Koehler, A. Acosta, et al.,
"Strain Additivity in III-V Channels for CMOSFETs beyond 22nm Technology Node",
2008 VLSI Symposium on VLSI Technology, pp. 182-183, October, 2008.
]