| Title | High-throughput focused-ion-beam lithography using doubly charged ions |
| Publication Type | Conference Paper |
| Year of Publication | 2013 |
| Authors | Garraud, N., J. Fridmann, B. P. Gila, and D. P. Arnold |
| Conference Name | Workshop on Enabling Nanofabrication for Rapid Innovation |
| Date Published | 08/2013 |
| Conference Location | Napa, CA |
