A Segmented‐Target Sputtering Process for Growth of Sub‐50 nm Ferroelectric Scandium–Aluminum–Nitride Films with Composition and Stress Tuning

TitleA Segmented‐Target Sputtering Process for Growth of Sub‐50 nm Ferroelectric Scandium–Aluminum–Nitride Films with Composition and Stress Tuning
Publication TypeJournal Article
Year of Publication2021
AuthorsRassay, S., F. Hakim, C. Li, C. Forgey, N. Choudhary, and R. Tabrizian
Journalphysica status solidi (RRL) – Rapid Research Letters
Volume15
Issue5
Pagination2100087
Date PublishedJan-05-2021
ISSN1862-6254
DOI10.1002/pssr.v15.510.1002/pssr.202100087
Short TitlePhysica Rapid Research Ltrs