| Title | Effect of furnace annealing on the ferroelectricity of Hf0.5 Zr0.5O2 thin films |
| Publication Type | Journal |
| Year of Publication | 2019 |
| Authors | Shekhawat, A., G. Walters, C. Chang Chung, Y. Liu, R. Garcia, J. Jones, T. Nishida, and S. Moghaddam |
| DOI | 10.1016/j.tsf.2019.03.031 |
