| Title | Data retention and low voltage operation of Al2O3/Hf0.5Zr0.5O2 based ferroelectric tunnel junctions |
| Publication Type | Journal |
| Year of Publication | 2020 |
| Authors | Shekhawat, A., G. Walters, N. Yang, J. Guo, T. Nishida, and S. Moghaddam |
| DOI | 10.1088/1361-6528/ab9cf7 |
