| Title | Tiered deposition of sub-5 nm ferroelectric Hf 1-x Zr x O 2 films on metal and semiconductor substrates |
| Publication Type | Journal Article |
| Year of Publication | 2018 |
| Authors | Walters, G., A. Shekhawat, N. G. Rudawski, S. Moghaddam, and T. Nishida |
| Journal | Applied Physics Letters |
| Volume | 112 |
| Issue | 19 |
| Pagination | 192901 |
| Date Published | Jul-05-2018 |
| ISSN | 0003-6951 |
| URL | http://aip.scitation.org/doi/10.1063/1.5027516 |
| DOI | 10.1063/1.5027516 |
| Short Title | Appl. Phys. Lett. |
