| Title | Key Differences for Process-Induced Uniaxial vs. Substrate-Induced Biaxial Stressed Si and Ge Channel MOSFETs |
| Publication Type | Conference Paper |
| Year of Publication | 2004 |
| Authors | Thompson, S., G-Y. Sun, K. Wu, and T. Nishida |
| Conference Name | IEDM Technical Digest |
| Date Published | December |
| Publisher | IEEE |
