| Title | Strain induced changes in gate leakage current and dielectric constant of nitrided Hf-silicate metal oxide semiconductor capacitors |
| Publication Type | Journal Article |
| Year of Publication | 2008 |
| Authors | Son, S. Y., Y. Choi, P. Kumar, H. W. Park, T. Nishida, R. K. Singh, and S. Thompson |
| Journal | Appl. Phys. Lett. |
| Volume | 93 |
| Pagination | 153505-1–153505-3 |
| Date Published | OCT |
| DOI | 10.1063/1.3000615 |
