Publications

Ngo, K., A. Phipps, T. Nishida, J. Lin, and S. Xu, "Power Converters for Piezoelectric Energy Extraction", Proceedings of ASME International Mechanical Engineering Congress and Exposition, Paper IMECE2006-14343, November, 2006.

Ngo, K., A. Phipps, T. Nishida, J. Lin, and S. Xu, "Power Converters for Piezoelectric Energy Extraction", Proceedings of ASME International Mechanical Engineering Congress and Exposition, Paper IMECE2006-14343, November, 2006.

Prasad, A., Q-S. Xue, V. Sankar, T. Nishida, G. Shaw, W. J. Streit, and J. C. Sanchez, "Predicting Microelectrode Array Functionality Using Biotic and Abiotic Metrics in Vivo", 34th Annual International Conference of the IEEE Engineering in Medicine and Biology Society, San Diego, CA, Aug 28-Sep 1, 2012.

Chow, E., A. Partridge, V. Chandrasekaran, M. Sheplak, T. Nishida, C. Quate, and T. Kenny, "Process Compatible Polysilicon-Based Electrical Through-Wafer Interconnects In Silicon Substrates", J. Microelectromechanical Systems, vol. 11, no. 6, pp. 631-640, JUL, 2002.

Dieme, R., J. Zhang, N. G. Rudawski, K. Jones, G. Bosman, M. Sheplak, and T. Nishida, "Process Dependence of 1/f Noise and Defects in Ion Implanted p-Type Piezoresistors", Journal of Applied Physics, vol. 112, 2012.

Kurdila, A., B. Carroll, T. Nishida, and M. Sheplak, "Reduced Order Modeling for Low Reynolds Number Flow Control", Proceedings of SPIEs 6th Annual International Symposium on Smart Structures and Materials, Mathematics Modeling and Control Conference, vol. 3667, Newport Beach, CA, pp. 68-79, March, 1999.

Choi, Y., H. W. Park, T. Nishida, and S. Thompson, "Reliability of HfSiON gate dielectric silicon MOS devices under [110] mechanical stress: Time dependent dielectric breakdown", J. Appl. Phys., vol. 105, pp. 044503-1–044503-5, FEB, 2009.

Wang, Z., J. Li, T. Nishida, and M. Sheplak, "Robust Capon Beamformers for Wideband Acoustic Imaging", 9th AIAA/CEAS Aeroacoustics Conference, AIAA Paper 2003-3198, Hilton Head, SC, May, 2003.

Saini, R., S. Bhardwaj, T. Nishida, and M. Sheplak, "Scaling Relations for Piezoresistive Microphones", International Mechanical Engineering Congress and Exposition, Orlando, FL, November, 2000.

Smith, C. S., K. Sondhi, S. C. Mills, J. S. Andrew, H. Z. Fan, T. Nishida, and D. P. Arnold, "Screen-printable and stretchable hard magnetic ink formulated from barium hexaferrite nanoparticles", Journal of Materials Chemistry C, 2020.

Smith, C. S., K. Sondhi, B. Y. Jimenez, H. Z. Fan, T. Nishida, and D. P. Arnold, "Screen-printed inductive silver ink strain sensor on stretchable TPU substrate", 2020 IEEE 70th Electronic Components and Technology Conference (ECTC), Virtual, 2020.

Kadirvel, S., F. Liu, S. Horowitz, T. Nishida, K. Ngo, L. Cattafesta, and M. Sheplak, "A Self-Powered Wireless Active Acoustic Liner", 12th AIAA/CEAS Aeroacoustics Conference, Cambridge, MA, May, 2006.

Kadirvel, S., F. Liu, S. Horowitz, T. Nishida, K. Ngo, L. Cattafesta, and M. Sheplak, "A Self-Powered Wireless Active Acoustic Liner", 12th AIAA/CEAS Aeroacoustics Conference, Cambridge, MA, May, 2006.

Han, K., and T. Nishida, "Sequential substrate and channel hot electron injection to separate oxide and interface traps in n-MOST", Solid-State Electronics, vol. 38, pp. 105-113, JAN, 1995.

Chandrasekharan, V., J. Naughton, and M. Sheplak, "Shear Stress Measurements", Encyclopedia of Aerocpace Engineering, 1, vol. 1, 2010.

Wang, M., J. Li, K. Ngo, and H. Xie, "Silicon Molding Techniques for Integrated Power MEMS Inductors", Sensors & Actuators: A. Physical, 2010.

Chu, M., A. D. Koehler, A. Gupta, T. Nishida, and S. Thompson, "Simulation of AlGaN/GaN high-electron-mobility transistor gauge factor based on two-dimnensional electron gas density and electron mobility", J. Appl. Phys. , vol. 108, pp. 6, 11/2010.

Bhardwaj, S., M. Sheplak, and T. Nishida, "S/N Optimization and Noise Considerations for Piezoresistive Microphones", 16th International Conference on Noise in Physical Systems and 1/f Fluctuations, Gainesville, FL, World Scientific, pp. 549-552, October, 2001.

Dieme, R., G. Bosman, M. Sheplak, and T. Nishida, "Source of Excess Noise in Silicon Piezoresistive Microphones", J. Acoustical Society of America, vol. 119, pp. 2710-2720, MAY, 2006.

Suthram, S., Y. Sun, P. Majhi, I. Ok, H. Kim, H. R. Harris, N. Goel, S. Parthasarathy, A. D. Koehler, A. Acosta, et al., "Strain Additivity in III-V Channels for CMOSFETs beyond 22nm Technology Node", 2008 VLSI Symposium on VLSI Technology, pp. 182-183, October, 2008.

Baykan, M., S. Thompson, and T. Nishida, "Strain effects on three-dimensional, two-dimensional, and one-dimensional silicon logic devices: Predicting the future of strained silicon", Journal of Applied Physics, vol. 108, no. 9, pp. 093716-24, 11/2010.

Son, S. Y., Y. Choi, P. Kumar, H. W. Park, T. Nishida, R. K. Singh, and S. Thompson, "Strain induced changes in gate leakage current and dielectric constant of nitrided Hf-silicate metal oxide semiconductor capacitors", Appl. Phys. Lett., vol. 93, pp. 153505-1–153505-3, OCT, 2008.

Yang, X., Y. Choi, J-S. Lim, T. Nishida, and S. Thompson, "Strain induced changes in the gate leakage current of n-channel metal-oxide-semiconductor field-effect transistors", J. Appl. Phys., vol. 109, pp. 9, 06/2011.

Ok, I., K. Akarvardar, S. Lin, M. Baykan, C.D. Young, P.Y. Hung, M.P. Rodgers, S. Bennett, H.O. Stamper, D.L. Franca, et al., "Strained SiGe and Si FinFETs for High Performance Logic with SiGe/Si Stack on SOI", International Electron Devices Meeting, San Francisco, CA, IEEE, 2010.

Yang, X., J. Lim, G-Y. Sun, K. Wu, T. Nishida, and S. Thompson, "Strain-induced Changes in the Gate Tunneling Currents in p-channel Metal-Oxide-Semiconductor Field-Effect Transistors", Applied Phys. Lett., vol. 88, pp. 052108, JAN, 2006.