Publications

Suthram, S., Y. Sun, P. Majhi, I. Ok, H. Kim, H. R. Harris, N. Goel, S. Parthasarathy, A. D. Koehler, A. Acosta, et al., "Strain Additivity in III-V Channels for CMOSFETs beyond 22nm Technology Node", 2008 VLSI Symposium on VLSI Technology, pp. 182-183, October, 2008.

Lim, J-S., A. Acosta, S. Thompson, G. Bosman, E. Simoen, and T. Nishida, "Effect of mechanical strain on 1/f noise in metal-oxide semiconductor field-effect transistors", J. Appl. Phys., vol. 105, pp. 054504-1–054504-11, MAR, 2009.