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Garraud, N., J. Fridmann, B. P. Gila, and D. P. Arnold, "High-throughput focused-ion-beam lithography using doubly charged ions", Workshop on Enabling Nanofabrication for Rapid Innovation, Napa, CA, pp. 22-23, 08/2013.
Chen, K.-H., F. Ren, A. Pais, H. Xie, B. P. Gila, S. J. Pearton, J. W. Johnson, P. Rajagopal, J. C. Roberts, E. L. Piner, et al., "Cu-plated through-wafer vias for AlGaN∕GaN high electron mobility transistors on Si", Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 27, issue 5, pp. 2166, 2009.