Publications

Ghatge, M., G. Walters, T. Nishida, and R. Tabrizian, "Phononic detection of morphological phase transition in atomic-layered Hafnium-Zirconium-Oxide", 2017 19th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS), Kaohsiung, Taiwan, IEEE, 2017.

Papila, M., R. T. Haftka, T. Nishida, and M. Sheplak, "Piezoresistive Microphone Design Pareto Optimization: Tradeoff Between Sensitivity and Noise Floor", 44th AIAA/ASME/ASCE/AHS Structures, Structural Dynamics, and Materials Conference, AIAA Paper 2003-1632, Norfolk, VA, April, 2003.

Arnold, D. P., S. Bhardwaj, S. Gururaj, T. Nishida, and M. Sheplak, "A Piezoresistive Microphone for Aeroacoustic Measurements", Proc. of ASME IMECE 2001, International Mechanical Engineering Congress and Exposition, Paper MEMS-23841, vol. 2, New York, NY, November, 2001.

Ngo, K., A. Phipps, T. Nishida, J. Lin, and S. Xu, "Power Converters for Piezoelectric Energy Extraction", Proceedings of ASME International Mechanical Engineering Congress and Exposition, Paper IMECE2006-14343, November, 2006.

Prasad, A., Q-S. Xue, V. Sankar, T. Nishida, G. Shaw, W. J. Streit, and J. C. Sanchez, "Predicting Microelectrode Array Functionality Using Biotic and Abiotic Metrics in Vivo", 34th Annual International Conference of the IEEE Engineering in Medicine and Biology Society, San Diego, CA, Aug 28-Sep 1, 2012.

Nishida, T., and C-T. Sah, "A physically based mobility model for MOSFET numerical simulation", IEEE Trans. Electron Devices, vol. 34, no. 2, pp. 310-320, FEB, 1987.

Sun, Y., S. Thompson, and T. Nishida, "Physics of Strain Effects in Semiconductors and Metal-Oxide-Semiconductor Field-effect Transistors", Journal of Applied Physics, vol. 101, pp. 104503-107524, JAN, 2007.

Suthram, S., J. Ziegert, T. Nishida, and S. Thompson, "Piezoresistance Coefficients of (100) Silicon nMOSFETs Measured at Low and High ( 1.5GPa) Channel Stress", IEEE Electron. Dev. Lett., vol. 28, pp. 58-61, JAN, 2007.

Papila, M., R. T. Haftka, T. Nishida, and M. Sheplak, "Piezoresistive Microphone Design Pareto Optimization: Tradeoff between Sensitivity and Noise Floor", J. Microelectromechanical Systems, vol. 15, no. 6, pp. 1632-1643, DEC, 2006.

Thompson, S., and T. Nishida, "Positive charge generation in SiO2 by electron-impact-emission of trapped electrons", Journal of Applied Physics, vol. 72, pp. 4683-4695, NOV, 1992.

Chow, E., A. Partridge, V. Chandrasekaran, M. Sheplak, T. Nishida, C. Quate, and T. Kenny, "Process Compatible Polysilicon-Based Electrical Through-Wafer Interconnects In Silicon Substrates", J. Microelectromechanical Systems, vol. 11, no. 6, pp. 631-640, JUL, 2002.

Dieme, R., J. Zhang, N. G. Rudawski, K. Jones, G. Bosman, M. Sheplak, and T. Nishida, "Process Dependence of 1/f Noise and Defects in Ion Implanted p-Type Piezoresistors", Journal of Applied Physics, vol. 112, 2012.