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Lomenzo, P. D., Q. Takmeel, C. Zhou, C-C. Chung, S. Moghaddam, J. L. Jones, and T. Nishida, "Mixed Al and Si doping in ferroelectric HfO 2 thin films", Applied Physics Letters, vol. 107, issue 24, pp. 242903, Feb-12-2016, 2015.