| Title | Depth profile of thermal donor in boron-doped Czochralski-grown silicon |
| Publication Type | Journal Article |
| Year of Publication | 1994 |
| Authors | Filangeri, E., and T. Nishida |
| Journal | Journal of Applied Physics |
| Volume | 75 |
| Pagination | 7931-7934 |
| Date Published | JUN |
| DOI | 10.1063/1.356580 |
